The demand for more exact device geometry and the tightening production tolerance also requires a suitable process control. Hence it is necessary to modify recipe parameters or the choice in controlling parameters between runs to adjust the continuous process and to improve the result.
The PeakPerformance™ eR2R allows the user to adapt any commercially available solutions or in-house developed solutions for run-to-run control so that the user can utilise the EE control models stored in the global database in conjunction with other EE applications. Through the embedded workflow engine, users can deploy their run-to-run models easily.
Use the powerful modelling structure of BISTel’s PeakPerformance™ eR2R to provide parameter analysis and realistic model demonstrations without real-time implementation.
The Goal
- Ensure the stability of the process
- Minimize the influence of disturbances on the process
- Optimize the performance of the process
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